Apparatus and method for improving power control loop linearity

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The Skyworks Solutions, Inc. patent solves the following problem:

The invention relates generally to closed loop power control system, and especially the closed loop power control system for use in wireless applications such as cell phone technology.

Our analysis of this patent is as follows:

Skyworks Solutions, Inc.’s patent US 6466772 B1 deals with Apparatus and method for improving power control loop linearity.
A closed loop power amplifier control system provided. A self-adapting driver circuit used to drive the power amplifier according to the feed back wrong signal. The driver circuit recover for non-linearities in the power amplifier.

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Surface modification of medical implants

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The Etex Corporation patent solves the following problem:

Diseased and damaged body parts best repaired or replaced own tissues of an organism. Physicians and surgeons often replace tissue, organs or bone through delicate and complicated medical procedures. Proper donor tissue generally get elsewhere either from the recipient's own body (autograft); from a second donor (allograft); or, in some cases, from a donor of another species (xenograft). Tissue transplantation is costly, and suffers from significant failure rates, an increase in the risk of disease transmission and inadequate supply of donor tissue. Therefore, in response to these current issues transplantation, the use of artificial or synthetic medical implant devices, fabricated through tissue engineering technology, the subject of considerable attention.

Our analysis of this patent is as follows:

Etex Corporation’s patent US 6464889 B1 deals with Surface modification of medical implants.
An irregularly etched metallic medical implant device with random non-uniform relief pattern on the surface of about 0.3 m to less than 20 m in depth. The random, irregular face as described in etch micromorphology and respective dimensional properties sobtained by exposing a surface to a reactive plasma in a chamber where said reactive plasma a reaction product with face to etch the surface, said reaction product or a complex with a vapor pressure lower than a pressure chamber; providing a dynamic masking agent during the process of etching; and removing the reaction products.

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