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The Mapper Lithography Ip B.V. patent solves the following problem:
The invention relates to a clustered substrate processing system comprising a plurality of elements lithography each arranged independent exposure of substrates according to data standards, and especially in network architecture for such a clustered substrate processing system.
Our analysis of this patent is as follows:
Mapper Lithography Ip B.V.’s patent US 9244726 B2 deals with Network architecture for lithography machine cluster.
The invention relates to a clustered substrate processing system comprising a plurality of elements lithography. Each lithography elements arranged for independent exposure of substrates according to data standards, and contains a number of lithography subsystems, a control network arranged for communication control information between the lithography subsystems and at least one element in the control unit, the control unit elements arranged to transmit commands lithography subsystems and lithography subsystems arranged passage in response to the element control unit, and a data network arranged for communication data logging information from the lithography subsystems at least some of the data network hub, the lithography subsystems arranged for transmitting data logging information into the data network hub and the data hub arranged for receiving and storing the data the logging information. The system further comprises a cluster of front-end interface for an operator or host system.
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